The resputtering of gold films from nano-holes defined in a sacrificial PMMA mask, which was made by electron beam lithography, was carried out with a dry plasma etching tool in order to form well-like structures with a high aspect ratio (height/width approximate to 3-4) at the rims of the nano-holes. The extraordinary transmission through the patterns of such nano-wells was investigated experimentally and numerically. By doing numerical simulations of 50-nm and 100-nm diameter polystyrene beads in water and air, we show the potential of such patterns for self-induced back-action (SIBA) trapping. The best trapping conditions were found to be a trapping force of 2 pN/W/mu m(2) (numerical result) exerted on a 50-nm diameter bead in water. The simulations were based on the analytical Lorentz force model.
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机译：使用干式等离子体蚀刻工具，通过电子束光刻技术，通过牺牲PMMA掩模中的纳米孔对金膜进行再溅射，以形成具有高深宽比（高度/宽度）的良好结构。大约3-4）在纳米孔的边缘。通过这种纳米孔的模式的非凡传输进行了实验和数值研究。通过对水和空气中直径为50 nm和100 nm的聚苯乙烯珠进行数值模拟，我们显示了这种模式用于自诱导背向作用（SIBA）捕获的潜力。发现最佳的捕获条件是对直径为50 nm的水珠施加2 pN / W /μm（2）的捕获力（数值结果）。模拟基于解析的洛伦兹力模型。
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